On the lithography floor, you know how quickly a 0.5°C drift during photoresist bake can kick critical dimension (CD) control out of spec. The Canon lithography heater bulb is built to keep thermal behavior locked inside the process window, shift after shift.
What matters under the hood
It uses short-wave infrared (IR) halogen emitters in a quartz envelope, so you get rapid, direct radiant heating with low thermal inertia. Across the bake zone, wafer-level uniformity holds at ±0.1°C, and temperature repeatability stays within ±0.2°C from lot to lot. The design is compatible with Class 1–100 cleanrooms, and the materials and terminations are chosen to keep particle generation and outgassing low. Output stability is specified to stay within 2% over 5,000+ hours, which helps you run long campaigns without chasing recalibration drift.
Here’s why this matters in photoresist processing. Soft bake after spin, then hard bake before etch or develop—temperature accuracy directly sets solvent removal, film stress, and CD bias. Tighter thermal control translates into fewer rework lots, less scrap, and more predictable overlay.
The fast-response IR profile cuts warm-up and cool-down time, which improves equipment utilization. Energy use is tuned by matching the spectral output to the photoresist thermal budget, so you don’t dump waste heat that can stress the chuck and the surrounding modules. And the reliability is engineered for 24/7 operation, which means fewer surprises and less maintenance load.
A few field realities
Installation has to follow the OEM connector and alignment specs—mismatched terminations can create hot spots and shorten lamp life. The bulb is optimized for Canon lithography platforms, and you need matched reflectors plus proper thermal management to hold that ±0.1°C uniformity.
Before you swap, verify bake-chamber geometry and power supply tolerances. Then keep the process honest by scheduling periodic infrared intensity checks—staying within the control plan is the only way to keep performance consistent.